<10 nm (Tap 300; 300AL; 300GD) <25nm (Electri-Tap 300) <15nm (Tap300DLC) Also see individual probes.
Half Cone Angle
20°-25° along cantilever axis 25°-30° from side 10°-at the apex
Tap300-GTip radius <10nm
Application:
Tapping, Intermittent Contact
General:
Rotated Monolithic silicon probe Symmetric Tip Shape Alignment Grooves (Chipsize 3.4 x 1.6 x 0.3mm)
Coating:
None
Tap300AL-GTip radius <10nm
Application:
Tapping, Intermittent Contact
General:
Rotated Monolithic silicon probe Symmetric Tip Shape Alignment Grooves (Chip size 3.4 x 1.6 x 0.3mm)
Coating:
30nm Al for enhanced reflectivity
Tap300GD-GTip radius <10nm
Application:
Non-contact, Tapping
General:
Rotated Monolithic silicon probe Symmetric Tip Shape Alignment Grooves (Chip size 3.4 x 1.6 x 0.3mm)
Coating:
70nm Au on back of cantilever
Tap300GBTip radius <25nm
Application:
Non-contact, Tapping, special application
General:
Rotated Monolithic silicon probe Symmetric Tip Shape Alignment Grooves or no Grooves (Chip size 3.4 x 1.6 x 0.3mm)
Coating:
70nm Au on both sides of cantilever
ElectriTap300-GTip radius <25nm
Application:
Tapping, Intermittent Contact Mode and Electric Modes like: • Scanning Capacitance Microscopy (SCM) • Electrostatic Force Microscopy (EFM) • Kelvin Probe Force Microscopy (KFM) • Scanning Probe Lithography
General:
Rotated Monolithic silicon probe Symmetric Tip Shape Alignment Grooves (Chip size 3.4 x 1.6 x 0.3mm)
Coating:
Electrically conductive Cr/Pt on both sides of cantilever. 5nm Cr covered with 25nm Pt.
Contact Resistance: 300 ohms on Pt thin film surface
TAP300DLCTip radius <15nm
Application:
Tapping, Intermittent Contact Mode
General:
Rotated Monolithic silicon probe Symmetric Tip Shape Alignment grooves (Chip size 3.4 x 1.6 x 0.3mm)
Coating:
Diamond-Like-Coating on tip side of cantilever, 15nm thick Aluminum Reflex coating on detector side of cantilever, 30nm thick This probe uses an "on scan angle" symmetric tip to provide a more symmetric representation of features over 200nm.