Silicon Magnification Specimen
Silicon Magnification Specimen
WHEN NOT IN USE, THE STANDARD SHOULD BE STORED UNDER VACUUM OR IN A SUITABLE DESICCATOR IN A TEMPURATURE CONTROLLED ENVIRONMENT
MAC MG15-T, 1μm Pitch Silicon Magnification Calibration Specimen
The MAC MG15-T magnification specimen is a 4mm x 4mm Boron doped, ultra-flat Silicon substrate with a 3mm x 3mm useable area. Consisting of:
• 1μm pitch grid with additional grid pitch lines at 10μm and 100μm
• Additional calibration lines for 1μm, 5μm and 10μm below the main grid
• X and Y scale, major edge fiducial markers for grid positioning at 0.5mm intervals and minor at 0.1mm intervals
Intended for use with SEM, FESEM, FIB, AUGER, SIMS and reflected light microscopy, useful for checking image calibration and distortion in the 100x to 10,000 magnification range.
Specification
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Substrate: |
525μm ±20μm thick Boron-doped ultra-flat silicon substrate with <100> orientation |
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Conductivity: |
5-10 ohm-cm |
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Grid Pitch/Precision |
1μm ± 0.025μm | 10μm ± 0.025μm | 100μm ± 0.25μm | Perpendicularity better than 0.01º |
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Line type/depth |
342nm ± 15nm deep etched lines |
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Line Width |
Grid |
218nm ± 10nm for 1μm pitch | 342nm ± 15nm for 10μm pitch | 451nm ± 20nm for 100μm pitch |
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Additional |
2.5μm ± 5% for 10μm pitch | 1.25μm ± 5% for 5μm pitch | 250nm ± 5% for 1μm pitch |
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Identification |
Etched specimen ID with unique serial number |
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Certification |
Wafer level certification traceable to a NIST standard |
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Expiry date |
None |
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Wafer Level Traceability to a NIST certified standard following the requirements of ISO: 17025
Documentation
Documentation
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