1
         / 
        of
        5
      
      
    Contact series for contact mode and pulse force mode
Contact series for contact mode and pulse force mode
| Technical Data: | ||
| Value | Range | |
| Resonant Freq. | 13 kHz | +/-4 kHz | 
| Force Constant | 0.2 N/m | 0.07 - 0.4 N/m | 
| Length | 450 µm | +/-10 µm | 
| Mean Width | 50 µm | +/-5 µm | 
| Thickness | 2 µm | +/-1 µm | 
| Tip Height | 17 µm | +/-2 µm | 
| Tip Set Back | 15 µm | +/-5 µm | 
| Tip Radius | <10 nm (Contact; ContAL; ContGD; ContGb) <25nm (ElectriCont) <15nm (ContDLC) Also see individual probes.  | 
|
| Half Cone Angle | 20°-25° along cantilever axis 25°-30° from side 10°-at the apex  | 
|


| Contact Tip radius <10nm | |
| Application: | Contact Mode, Pulsed Force Mode (PFM) | 
| General: | Rotated Monolithic silicon probe Symetric Tip Shape Alignment Grooves (except for 1, see below) (Chipsize 3.4 x 1.6 x 0.3mm)  | 
| Coating: | None | 

| ContAL Tip radius <10nm | |
| Application: | Contact Mode, Pulsed Force Mode (PFM) | 
| General: | 
 Rotated Monolithic silicon probe  | 
| Coating: | 30nm Al for enhanced reflectivity | 

| ContGD Tip radius <10nm | |
| Application: | Contact Mode, Pulsed Force Mode (PFM) | 
| General: | Rotated Monolithic silicon probe Symetric Tip Shape Alignment Grooves (Chipsize 3.4 x 1.6 x 0.3mm)  | 
| Coating: | 70nm Au on back of cantilever | 

| ContGB Tip radius <25nm | |
| Application: | Contact Mode, Pulsed Force Mode (PFM) | 
| General: | Rotated Monolithic silicon probe Symetric Tip Shape Alignment Grooves (Chipsize 3.4 x 1.6 x 0.3mm)  | 
| Coating: | 70nm Au on both sides of cantilever | 
![]()
| ElectriCont-G Tip radius <25nm | |
| Application: | Contact Mode, Pulsed Force Mode (PFM) and Electric Modes like: • Scanning Capacitance Microscopy (SCM) • Electrostatic Force Microscopy (EFM) • Kelvin Probe Force Microscopy (KFM) • Scanning Probe Lithography  | 
| General: | Rotated Monolithic silicon probe Symetric Tip Shape Alignment Grooves (Chip size 3.4 x 1.6 x 0.3mm)  | 
| Coating: | Electrically conductive Cr/Pt on both sides of cantilever. 5nm Cr covered with 25nm Pt. | 
Contact Resistance: 300 ohms on Pt thin film surface

| ContDLC Tip radius <15nm | |
| Application: | Contact Mode | 
| General: | Rotated Monolithic silicon probe Symmetric Tip Shape Alignment grooves (Chip size 3.4 x 1.6 x 0.3mm)  | 
| Coating: | Diamond-Like-Coating on tip side of cantilever, 15nm thick Aluminum Reflex coating on detector side of cantilever, 30nm thick This probe uses an "on scan angle" symmetric tip to provide a more symmetric representation of features over 200nm.  | 
                      
                        
                        
                          Documentation
                        
                      
                    
                  Documentation

              
    
    
    
    