PELCO® Silicon Nitride Coated and Silicon Ø3mm Discs (blanks)

Silicon Nitride Blank

These 3mm Silicon Discs have an ultra-flat (Ra 0.45 ± 0.2nm) 50nm ultra-low-stress Silicon Nitride layer on both sides. Also available with a hydrophilic or hydrophobic surface coating or just as a silicon disk. The disks are made with the same state-of-the-art manufacturing techniques as the PELCO^® Silicon Nitride Support Films. The disks are perfectly round and have the Easygrip™ edge for easy handling. Clean surface, no broken edges and free of debris often associated with other manufacturing processes. The ultra-low-stress film is nonstoichiometric and closer to SiN than Si3N4. They can be used for a number of applications:

• Specimen mounts for SEM and FESEM applications
• Specimen discs for AFM applications
• Blanks to build the PELCO® Liquid Cell™ together with the PELCO^® Silicon Nitride Membrane

Product Specifications

• Film Thickness: 50nm ultra-low-stress Silicon Nitride on both sides
• Hydrophilic: 5nm atomic layer-deposited hydroxylated alumina on 50nm ultra-low-stress silicon nitride.
• Hydrophobic: 5nm atomic layer-deposited alumina and fluoro-methylsilane on ultra-low-stress silicon nitride.
• Disk Thickness: 200µm silicon support
• Disk Diameter: 3mm
• Surface Roughness: The RMS (Rq) is 0.65 +/- 0.06nm which gives a mean roughness (Ra) of 0.45 +/- 0.02nm
• Packaging: The PELCO^® Silicon Nitride Discs with hydrophilic or hydrophobic coating are packaged under cleanroom conditions. The discs are packed in a vial holding 10 discs.

SDS (367KB PDF)